Assemblies having vertically-extending structures, and methods of forming assemblies having vertically-extending channel material pillars

ABSTRACT

Some embodiments include an assembly which has channel material pillars, and which has memory cells along the channel material pillars. A conductive structure is under the channel material pillars. The conductive structure has doped semiconductor material in direct contact with bottom regions of the channel material pillars. One or more of magnesium, scandium, yttrium and lanthanide elements is along the bottom regions of the channel material pillars. Some embodiments include methods of forming assemblies. A structure is formed, and a mass is formed against an upper surface of the structure. Plugs are formed within openings in the mass. The plugs comprise a second material over a first material. The first material includes one or more of magnesium, scandium, yttrium and lanthanide elements. Openings are formed to terminate on the first material, and are then extended through the first material. Channel material pillars are formed within the openings.

RELATED PATENT DATA

This patent resulted from a continuation of U.S. patent application Ser.No. 15/852,989 which was filed Dec. 22, 2017 and which is herebyincorporated by reference herein.

TECHNICAL FIELD

Assemblies having vertically-extending structures, and methods offorming assemblies having vertically-extending channel material pillars.The assemblies may include one or more of magnesium, scandium, yttriumand lanthanide elements along bottom regions of the vertically-extendingstructures.

BACKGROUND

Memory provides data storage for electronic systems. Flash memory is onetype of memory, and has numerous uses in modern computers and devices.For instance, modern personal computers may have BIOS stored on a flashmemory chip. As another example, it is becoming increasingly common forcomputers and other devices to utilize flash memory in solid statedrives to replace conventional hard drives. As yet another example,flash memory is popular in wireless electronic devices because itenables manufacturers to support new communication protocols as theybecome standardized, and to provide the ability to remotely upgrade thedevices for enhanced features.

NAND may be a basic architecture of flash memory, and may be configuredto comprise vertically-stacked memory cells.

Before describing NAND specifically, it may be helpful to more generallydescribe the relationship of a memory array within an integratedarrangement. FIG. 1 shows a block diagram of a prior art device 100which includes a memory array 102 having a plurality of memory cells 103arranged in rows and columns along with access lines 104 (e.g.,wordlines to conduct signals WL0 through WLm) and first data lines 106(e.g., bitlines to conduct signals BL0 through BLn). Access lines 104and first data lines 106 may be used to transfer information to and fromthe memory cells 103. A row decoder 107 and a column decoder 108 decodeaddress signals A0 through AX on address lines 109 to determine whichones of the memory cells 103 are to be accessed. A sense amplifiercircuit 115 operates to determine the values of information read fromthe memory cells 103. An I/O circuit 117 transfers values of informationbetween the memory array 102 and input/output (I/O) lines 105. SignalsDQ0 through DQN on the I/O lines 105 can represent values of informationread from or to be written into the memory cells 103. Other devices cancommunicate with the device 100 through the I/O lines 105, the addresslines 109, or the control lines 120. Memory control unit 118 controlsmemory operations performed on the memory cells 103 utilizing signals onthe control lines 120. The device 100 can receive supply voltage signalsVcc and Vss on a first supply line 130 and a second supply line 132,respectively. The device 100 includes a select circuit 140 and aninput/output (I/O) circuit 117. The select circuit 140 can respond, viathe I/O circuit 117, to signals CSEL1 through CSELn to select signals onthe first data lines 106 and the second data lines 113 that canrepresent the values of information to be read from or to be programmedinto the memory cells 103. The column decoder 108 can selectivelyactivate the CSEL1 through CSELn signals based on the A0 through AXaddress signals on the address lines 109. The select circuit 140 canselect the signals on the first data lines 106 and the second data lines113 to provide communication between the memory array 102 and the I/Ocircuit 117 during read and programming operations.

The memory array 102 of FIG. 1 may be a NAND memory array, and FIG. 2shows a block diagram of a three-dimensional NAND memory device 200which may be utilized for the memory array 102 of FIG. 1. The device 200comprises a plurality of strings of charge-storage devices. In a firstdirection (Z-Z′), each string of charge-storage devices may comprise,for example, thirty-two charge-storage devices stacked over one anotherwith each charge-storage device corresponding to one of, for example,thirty-two tiers (e.g., Tier0-Tier31). The charge-storage devices of arespective string may share a common channel region, such as one formedin a respective pillar of semiconductor material (e.g., polysilicon)about which the string of charge-storage devices is formed. In a seconddirection (X-X′), each first group of, for example, sixteen first groupsof the plurality of strings may comprise, for example, eight stringssharing a plurality (e.g., thirty-two) of access lines (i.e., “globalcontrol gate (CG) lines”, also known as wordlines, WLs). Each of theaccess lines may couple the charge-storage devices within a tier. Thecharge-storage devices coupled by the same access line (and thuscorresponding to the same tier) may be logically grouped into, forexample, two pages, such as P0/P32, P1/P33, P2/P34 and so on, when eachcharge-storage device comprises a cell capable of storing two bits ofinformation. In a third direction (Y-Y′), each second group of, forexample, eight second groups of the plurality of strings, may comprisesixteen strings coupled by a corresponding one of eight data lines. Thesize of a memory block may comprise 1,024 pages and total about 16 MB(e.g., 16 WLs×32 tiers×2 bits=1,024 pages/block, block size=1,024pages×16 KB/page=16 MB). The number of the strings, tiers, access lines,data lines, first groups, second groups and/or pages may be greater orsmaller than those shown in FIG. 2.

FIG. 3 shows a cross-sectional view of a memory block 300 of the 3D NANDmemory device 200 of FIG. 2 in an X-X′ direction, including fifteenstrings of charge-storage devices in one of the sixteen first groups ofstrings described with respect to FIG. 2. The plurality of strings ofthe memory block 300 may be grouped into a plurality of subsets 310,320, 330 (e.g., tile columns), such as tile column_(I), tile column_(j)and tile column_(K), with each subset (e.g., tile column) comprising a“partial block” of the memory block 300. A global drain-side select gate(SGD) line 340 may be coupled to the SGDs of the plurality of strings.For example, the global SGD line 340 may be coupled to a plurality(e.g., three) of sub-SGD lines 342, 344, 346 with each sub-SGD linecorresponding to a respective subset (e.g., tile column), via acorresponding one of a plurality (e.g., three) of sub-SGD drivers 332,334, 336. Each of the sub-SGD drivers 332, 334, 336 may concurrentlycouple or cut off the SGDs of the strings of a corresponding partialblock (e.g., tile column) independently of those of other partialblocks. A global source-side select gate (SGS) line 360 may be coupledto the SGSs of the plurality of strings. For example, the global SGSline 360 may be coupled to a plurality of sub-SGS lines 362, 364, 366with each sub-SGS line corresponding to the respective subset (e.g.,tile column), via a corresponding one of a plurality of sub-SGS drivers322, 324, 326. Each of the sub-SGS drivers 322, 324, 326 mayconcurrently couple or cut off the SGSs of the strings of acorresponding partial block (e.g., tile column) independently of thoseof other partial blocks. A global access line (e.g., a global CG line)350 may couple the charge-storage devices corresponding to therespective tier of each of the plurality of strings. Each global CG line(e.g., the global CG line 350) may be coupled to a plurality ofsub-access lines (e.g., sub-CG lines) 352, 354, 356 via a correspondingone of a plurality of sub-string drivers 312, 314 and 316. Each of thesub-string drivers may concurrently couple or cut off the charge-storagedevices corresponding to the respective partial block and/or tierindependently of those of other partial blocks and/or other tiers. Thecharge-storage devices corresponding to the respective subset (e.g.,partial block) and the respective tier may comprise a “partial tier”(e.g., a single “tile”) of charge-storage devices. The stringscorresponding to the respective subset (e.g., partial block) may becoupled to a corresponding one of sub-sources 372, 374 and 376 (e.g.,“tile source”) with each sub-source being coupled to a respective powersource.

The NAND memory device 200 is alternatively described with reference toa schematic illustration of FIG. 4.

The memory array 200 includes wordlines 202 ₁ to 202 _(N), and bitlines228 ₁ to 228 _(M).

The memory array 200 also includes NAND strings 206 ₁ to 206 _(M). EachNAND string includes charge-storage transistors 208 ₁ to 208 _(N). Thecharge-storage transistors may use floating gate material (e.g.,polysilicon) to store charge, or may use charge-trapping material (suchas, for example, silicon nitride, metallic nanodots, etc.) to storecharge.

The charge-storage transistors 208 are located at intersections ofwordlines 202 and strings 206. The charge-storage transistors 208represent non-volatile memory cells for storage of data. Thecharge-storage transistors 208 of each NAND string 206 are connected inseries source-to-drain between a source-select device (e.g., source-sideselect gate, SGS) 210 and a drain-select device (e.g., drain-side selectgate, SGD) 212. Each source-select device 210 is located at anintersection of a string 206 and a source-select line 214, while eachdrain-select device 212 is located at an intersection of a string 206and a drain-select line 215. The select devices 210 and 212 may be anysuitable access devices, and are generically illustrated with boxes inFIG. 1.

A source of each source-select device 210 is connected to a commonsource line 216. The drain of each source-select device 210 is connectedto the source of the first charge-storage transistor 208 of thecorresponding NAND string 206. For example, the drain of source-selectdevice 210 ₁ is connected to the source of charge-storage transistor 208₁ of the corresponding NAND string 206 ₁. The source-select devices 210are connected to source-select line 214.

The drain of each drain-select device 212 is connected to a bitline(i.e., digit line) 228 at a drain contact. For example, the drain ofdrain-select device 212 ₁ is connected to the bitline 228 ₁. The sourceof each drain-select device 212 is connected to the drain of the lastcharge-storage transistor 208 of the corresponding NAND string 206. Forexample, the source of drain-select device 212 ₁ is connected to thedrain of charge-storage transistor 208 _(N) of the corresponding NANDstring 206 ₁.

The charge-storage transistors 208 include a source 230, a drain 232, acharge-storage region 234, and a control gate 236. The charge-storagetransistors 208 have their control gates 236 coupled to a wordline 202.A column of the charge-storage transistors 208 are those transistorswithin a NAND string 206 coupled to a given bitline 228. A row of thecharge-storage transistors 208 are those transistors commonly coupled toa given wordline 202.

Three-dimensional integrated memory assemblies (e.g., three-dimensionalNAND) may have vertical channel pillars extending to horizontal wiring(e.g., source lines). It can be difficult to achieve uniform contactbetween the channel pillars and the associated horizontal wiring. Itwould be desirable to develop improved methods for fabricatingintegrated memory assemblies such that desired contact between thechannel material pillars and the horizontal wiring is achieved.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a block diagram of a prior art memory device having amemory array with memory cells.

FIG. 2 shows a schematic diagram of the prior art memory array of FIG. 1in the form of a 3D NAND memory device.

FIG. 3 shows a cross sectional view of the prior art 3D NAND memorydevice of FIG. 2 in an X-X′ direction.

FIG. 4 is a schematic of a prior art NAND memory array.

FIGS. 5-8 are diagrammatic cross-sectional views of example assembliescomprising regions of example memory arrays.

FIG. 5A is a top-down cross-sectional view along the line A-A of FIG. 5.

FIGS. 9-16 are diagrammatic cross-sectional views of regions of anexample construction at example process stages of an example method forfabricating an example memory array.

FIGS. 17 and 18 are diagrammatic cross-sectional views of regions of anexample construction at example process stages of an example method forfabricating an example memory array. The process stage of FIG. 17 mayfollow that of FIG. 13.

FIGS. 19-22 are diagrammatic cross-sectional views of regions of anexample construction at example process stages of an example method forfabricating an example memory array. The process stage of FIG. 19 mayfollow that of FIG. 9.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Some embodiments include methods in which segments of etch-stop materialare provided along locations of a conductive structure (e.g., a sourceline) where electrical contact to channel material pillars is desired.The etch-stop material may comprise one or more of magnesium, scandium,yttrium and lanthanide elements. Openings may be extended through astack of alternating first and second levels, and to the etch-stopmaterial. Subsequently, the openings may be extended through theetch-stop material to the conductive structure, and then the channelmaterial pillars may be formed within the openings. Memory cells may beformed along the channel material pillars to form a memory array, suchas a three-dimensional NAND memory array. In some embodiments, some ofthe etch-stop material may remain along bottom regions of the channelmaterial pillars in the finished memory array. Example embodiments aredescribed with reference to FIGS. 5-22.

Referring to FIG. 5, a region of an assembly 10 is illustrated. Theassembly 10 includes a plurality of vertically-stacked memory cells 12.Such memory cells may be NAND memory cells, and may be part of a NANDmemory array.

The memory cells include channel material 14, tunneling material 16,charge-storage material 18, and charge-blocking material 20.

The channel material 14 is configured as vertically-extending channelmaterial pillars 22. In the illustrated embodiment, the pillars 22 are“hollow” in that they have voids 24 extending therein. Such voids arefilled with insulative material 26. In other embodiments, the pillars 22may be solid rather than being in the illustrated hollow configuration.

The memory cells 12 may be considered to be arranged along the channelmaterial pillars 22.

The channel material 14 may comprise any suitable composition(s); and insome embodiments may comprise one or more of silicon, germanium, III/Vsemiconductor materials (e.g., gallium phosphide), semiconductor oxides,etc.

The tunneling material 16 is sometimes referred to as gate dielectric.The tunneling material 16 may comprise any suitable composition(s); andin some embodiments may comprise, for example, one or more of silicondioxide, aluminum oxide, hafnium oxide, zirconium oxide, etc.

The charge-storage material 18 may comprise any suitable composition(s);and in some embodiments may comprise charge-trapping materials, such assilicon nitride, silicon oxynitride, conductive nanodots, etc. Inalternative embodiments (not shown), the charge-storage material 18 maybe configured as floating gate material (such as, for example,polycrystalline silicon).

The charge-blocking material 20 may comprise any suitablecomposition(s); and in some embodiments may comprise one or more ofsilicon dioxide, aluminum oxide, hafnium oxide, zirconium oxide, etc.

The insulative material 26 may comprise any suitable composition(s); andin some embodiments may comprise silicon dioxide.

The channel material pillars 22 extend through a stack 28 of alternatinginsulative levels 30 and conductive levels 32.

The conductive levels 32 comprise conductive material 33. Suchconductive material may comprise, for example, one or more of variousmetals (for example, tungsten, titanium, etc.), metal-containingcompositions (for example, metal nitride, metal carbide, metal silicide,etc.), and conductively-doped semiconductor materials (for example,conductively-doped silicon, conductively-doped germanium, etc.). Forinstance, the conductive levels 30 may comprise n-type dopedpolycrystalline silicon (i.e., n-type doped polysilicon) of SONOS(semiconductor-oxide-nitride-oxide-semiconductor), or metal of MONOS(metal-oxide-nitride-oxide-semiconductor); with an example MONOS beingTANOS (tantalum-alumina-nitride-oxide-semiconductor). In someembodiments, the conductive levels 32 may comprise titanium nitridearound a metallic core, with the metallic core comprising tungsten ortantalum.

The conductive levels 32 may correspond to wordlines, and may comprisecontrol gates 34 for the memory cells 12. In some embodiments, thevertically-stacked memory cells 12 are configured as NAND strings, withthe number of memory cells 12 in the individual strings being determinedby the number of conductive levels 32. The NAND strings may comprise anysuitable number of memory cell levels. For instance, the NAND stringsmay have 8 memory cell levels, 16 memory cell levels, 32 memory celllevels, 64 memory cell levels, 512 memory cell levels, 1024 memory celllevels, etc.

The insulative levels 30 comprise insulative material 31. Suchinsulative material may comprise any suitable composition or combinationof compositions; and may, for example, comprise, consist essentially of,or consist of silicon dioxide.

The levels 30 and 32 may be of any suitable thicknesses; and may be thesame thickness as one another, or different thicknesses relative to oneanother.

The channel material pillars 22 extend through an insulative mass 36 andcontact a conductive structure 38.

A gap is provided between the stack 28 and the insulative mass 36 toindicate that there may be additional materials and/or componentsprovided within the assembly 10 which are not shown. For instance,source-side select gates may be provided within the illustrated gapbetween the stack 28 and insulative mass 36.

The insulative mass 36 may comprise any suitable composition(s) such as,for example, silicon dioxide.

The conductive structure 38 may correspond to a source line analogous tothe source line 216 discussed above with reference to FIG. 4. Theconductive structure 38 may comprise any suitable composition(s). Insome embodiments, the illustrated region of the conductive structure 38comprises conductively-doped semiconductor material 40 (for instance,n-type silicon). In some embodiments, the conductively-dopedsemiconductor material 40 may be over and directly against ametal-containing material (not shown). For instance, the conductivestructure 38 may comprise doped semiconductor material 40 over ametal-containing material (such as, for example, a material comprisingone or more of titanium nitride, tungsten, tantalum nitride, etc.).

In some embodiments, the conductive structure 38 may be considered to berepresentative of a horizontally-extending structure, and thesemiconductor material 40 may be referred to as a first semiconductormaterial. The channel material pillars 22 may be considered to berepresentative of vertically-extending structures over thehorizontally-extending structure 38, and may be considered to comprise asecond semiconductor material 14. The first and second semiconductormaterials 40 and 14 may be the same composition as one another in someembodiments (for instance, both may comprise n-type doped silicon), ormay be different compositions than one another (for instance, one mayprimarily comprise germanium while the other primarily comprisessilicon).

Although three vertically-extending structures 22 are illustrated inFIG. 5, it is to be understood that any suitable number ofvertically-extending structures may be associated with thehorizontally-extending structure 38. Generally, there will be at leastone vertically-extending structure 22 associated with thehorizontally-extending structure 38.

The terms “vertically-extending” and “horizontally-extending” areutilized relative to one another to indicate that the structure 38extends primarily along a horizontal direction, while the structures 22extend primarily along the vertical directions. In some embodiments, thestructures 22 may be absolutely vertical, and the structure 38 may beabsolutely horizontal, so that the structures 22 extend orthogonallyrelative to the structure 38. In other embodiments, the structures 22may extend substantially orthogonally relative to the structure 38, withthe term “substantially orthogonal” meaning orthogonal to withinreasonable tolerances of fabrication and measurement.

The channel material pillars 22 have bottom regions 42 within theinsulative mass 36. Such bottom regions include terminal ends 43 of thepillars 22, and include non-terminal segments 45 above the terminalends. The terminal ends 43 directly contact the conductive material 40of the conductive structure 38, and the non-terminal segments 45 areabove the terminal ends 43.

The bottom regions 42 have a vertical dimension H. Such verticaldimension may be any suitable vertical dimension; and in someembodiments may be less than or equal to about 150 (nanometers) nm, lessthan or equal to about 100 nm, or less than or equal to about 50 nm. Thechannel material pillars 22 may have any suitable total height; and insome embodiments may have a total height of at least about 1 micron (μ),at least about 2μ, etc. Accordingly, the bottom region 42 of the channelmaterial pillars is a small percentage of the overall height of thechannel material pillars.

Each of the channel material pillars 22 is adjacent a structure 44, withthe structures 44 being outwardly displaced relative to thecharge-blocking material 20 in the illustrated embodiment. The bottomregions 42 of the pillars 22 may be defined to be the regions of pillars22 that are at or below an elevational level of the uppermost surfacesof the structures 44. FIG. 5A is a view along the line A-A of FIG. 5 andshows that each structure 44 is an annular ring surrounding one of thechannel material pillars 22.

The structures 44 comprise etch-stop material 46 (with a purpose of theetch-stop material being described in more detail below with referenceto FIGS. 13 and 14). In some embodiments, the etch-stop material 46 maycomprise one or more of magnesium (Mg), scandium (Sc), yttrium (Y) andlanthanide elements. The term “lanthanide elements” means the 15 rareearth elements having atomic numbers 57 through 71; and specificallyincludes lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd),promethium (Pm), samarium (Sm), europium (Eu), gadolinium (Gd), terbium(Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm),ytterbium (Yb) and lutetium (Lu). In some applications, the material 46may comprise oxides of one or more of Mg, Sc, Y, La, Ce, Pr, Nd, Pm, Sm,Eu, Gd, Tb, Dy, Ho, Er, Tm, Tb and Lu. For instance, in some embodimentsthe material 46 may comprise, consist essentially of, or consist of oneor more of magnesium oxide, cerium oxide and lanthanum oxide.

The structures 44 are along the bottom regions 42 of the channelmaterial pillars 22. In the embodiment of FIG. 5, the structures 44 arealong the terminal ends 43 of the channel material pillars 22, and arealso along the non-terminal segments 45. Accordingly, the elementswithin the composition of structures 44 may be detected along theterminal ends of the channel material pillars 22, as well as along thenon-terminal segments 45 with appropriate analytical analysis of theconfiguration of FIG. 5.

The structures 44 are angled relative to the vertically-extendingcharge-blocking material 20, and regions of the structures 44 are spacedfrom the charge-blocking material 20 by an intervening material 48. Theintervening material 48 may comprise any suitable composition(s); and insome embodiments may comprise, consist essentially of, or consist ofsilicon dioxide.

The stack 28 and conductive structure 38 are shown to be supported overa base 50. The base 50 may comprise semiconductor material; and may, forexample, comprise, consist essentially of, or consist of monocrystallinesilicon. The base 50 may be referred to as a semiconductor substrate.The term “semiconductor substrate” means any construction comprisingsemiconductive material, including, but not limited to, bulksemiconductive materials such as a semiconductive wafer (either alone orin assemblies comprising other materials), and semiconductive materiallayers (either alone or in assemblies comprising other materials). Theterm “substrate” refers to any supporting structure, including, but notlimited to, the semiconductor substrates described above. In someapplications, the base 50 may correspond to a semiconductor substratecontaining one or more materials associated with integrated circuitfabrication. Such materials may include, for example, one or more ofrefractory metal materials, barrier materials, diffusion materials,insulator materials, etc.

A gap is provided between the structure 38 and the base 50 to indicatethat other components and materials may be provided between thestructure 38 and the base 50.

The configuration of FIG. 5 shows the channel material pillars 22extending to an upper surface of the conductive structure 38. In otherembodiments, the channel material pillars 22 may penetrate into theconductive material 40 of the conductive structure 38, as shown in FIG.6. In such embodiments, the structures 44 may also penetrate into thematerial 40 of the conductive structure 38 (as shown in FIG. 6).Accordingly, the composition of the structures 44 may penetrate into theconductive material 40 and be detectable as extending into theconductive material 40; with such composition including one or more ofMg, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Tb and Luand some embodiments.

In the illustrated embodiment of FIG. 6, the bottom regions 42 of thechannel material pillars 22 are shown to include portions of the channelmaterial pillars which extend into the conductive material 40 of theconductive structure 38, as well as portions of the channel materialpillars within the insulative mass 36.

In some embodiments, some of the material 46 of structures 44 may beremoved with a wet etch (described below with reference to FIG. 17) sothat the remaining material 46 is over a void region. Examples of suchembodiments are shown in FIGS. 7 and 8. FIG. 7 shows a configurationanalogous to that of FIG. 5, but the material 46 of structures 44 isover void regions 52. Accordingly, the material 46 is along non-terminalsegments 45 of the channel material pillars 22, but is not along theterminal ends 43 of the channel material pillars. FIG. 8 shows aconfiguration analogous to that of FIG. 6, but differs from FIG. 6 inthat the material 46 of structures 44 is over void regions 52.

The assemblies discussed above with reference to FIGS. 5-8 may be formedwith any suitable processing. Example processing is described withreference to FIGS. 9-22.

Referring to FIG. 9, construction 10 is shown at a process stage afterthe horizontally-extending structure 38 has been formed across the base50 (the base 50 is shown in FIG. 1, but is not shown in FIG. 9 in orderto simplify FIG. 9 and the drawings which follow). The structure 38includes the material 40. The material 40 comprises conductively-dopedsemiconductor material; such as, for example, n-type polysilicon. Insome embodiments, the material 40 may be referred to as a firstsemiconductor material.

The structure 38 comprises an upper surface 39 along the material 40,and the mass 36 is formed across such upper surface. In the illustratedembodiment, the mass 36 is directly against the upper surface 39 of thematerial 40.

The mass 36 may comprise any suitable material. For instance, the mass36 may comprise, consist essentially of, or consist of silicon dioxide.In some embodiments, the mass 36 may be referred to as an insulativemass.

Referring to FIG. 10, openings 54 are formed through the mass 36 to theupper surface 39 of the material 40. Although the openings 54 are shownextending only to the upper surface of the material 40, in otherembodiments the openings 54 may penetrate into the material 40.

Referring to FIG. 11, the openings 54 are lined with the material 46 tonarrow the openings, and the narrowed openings are then filled withmaterial 48. Subsequently, planarization (e.g., chemical-mechanicalpolishing) may be conducted to form the illustrated planarized surface55 extending across the mass 36 and the materials 46 and 48. Thematerials 46 and 48 may be referred to as first and second materials,respectively; and may comprise the compositions described above relativeto FIG. 5. In some example embodiments, the second material 48 maycomprise, consist essentially of, or consist of silicon dioxide. In someexample embodiments, the first material 46 may comprise one or more ofmagnesium, scandium, yttrium and lanthanide elements incorporated intoone or more oxides.

The first and second materials 46 and 48 together form plugs 56 withinthe openings 54.

Referring to FIG. 12, a stack 58 is formed over the mass 36 and plugs56. The stack 58 comprises first levels 60 and second levels 62 whichalternate with one another. The levels 60 comprise material 61, and thelevels 62 comprise material 63. In some embodiments, the materials 61and 63 may be the same as the materials 31 and 33, respectively, of FIG.5. Thus, the stack 58 of FIG. 12 may be the same as the stack 28 of FIG.5. Alternatively, the levels 60 may comprise insulative material (forinstance, the same material as levels 30 of FIG. 5; and in someembodiments may comprise silicon dioxide), and the levels 62 maycomprise sacrificial material (e.g., silicon nitride) suitable forutilization in gate replacement methodologies.

Referring to FIG. 13, openings 64 are formed to extend through the stack58, and through the second material 48 of the plugs 56 (with the plugs56 being shown in FIG. 12). The openings 64 terminate on the firstmaterial 46. In some embodiments, the material 46 may be referred to asan etch-stop material in that such material stops the downwardprogression of the etch utilized to form openings 64.

Referring to FIG. 14, the openings 64 are extended through the material46. Such exposes regions of the upper surface 39 of the semiconductormaterial 40. Although the openings 64 are shown stopping at the uppersurface 39 of semiconductor material 40, in other embodiments theopenings may extend into the semiconductor material 40.

An advantage of utilizing the etch-stop material 46 is that such mayenable all of the openings 64 to be uniformly formed to substantiallyidentical depths (with the term “substantially identical” meaningidentical to within reasonable tolerances of fabrication andmeasurement). As integration density increases, it is desired to formopenings 64 to increasingly higher critical dimensions. It can bedifficult to fabricate all of the openings to be of substantiallyuniform depths as one another unless the openings are formed with themulti-step processing of FIGS. 13 and 14. Specifically, the openings 64are first formed with a process having a stop point defined by theetch-stop material 46. Accordingly, to the extent that there isvariation in the etch rate across the openings 64, the variation willnot matter in the end because all of the openings terminate at a commondepth defined by the etch-stop material 46. The openings are thenextended with a second process which penetrates through the etch-stopmaterial 46. The second process may be a timed process, and will be arelatively short etch since the openings are only extended by a minoramount. Accordingly, there will be little (if any) variation of thedepths to which the openings 64 penetrate during the second processsince the second process is too short of an etch to enable large amountsof variation to manifest across the openings.

It is noted that some conventional processes fabricate openingsanalogous to the openings 64 by utilizing the mass 36 as an etch-stopmaterial. In other words, the conventional methods lack the plugs 56 ofFIG. 11, and instead utilize the entire mass 36 as an etch-stopmaterial. A problem with such conventional methods is that they may notbe cost-effective when utilizing the specialized etch-stop materialsdescribed herein. Instead, the conventional methods typically utilizealuminum oxide as the etch-stop material. In contrast, methodologiesdescribed herein may cost-effectively utilize oxides of one or more ofmagnesium, scandium, yttrium and lanthanide elements. Such may provideat least a 10-fold enhancement of etch selectivity as compared toaluminum oxide for the etches utilized to form openings 64 (e.g., foretches penetrating through silicon dioxide of levels 60 and siliconnitride of levels 62).

Referring to FIG. 15, the vertically-extending channel material pillars22 are formed within the openings 64, together with the tunnelingmaterial 16, charge-storage material 18, and charge-blocking material20. The channel material pillars 22 comprise the channel material 14;which in some embodiments may be referred to as a second semiconductormaterial. The second semiconductor material 14 may be compositionallythe same as the first semiconductor material 40, or may becompositionally different from the first semiconductor material 40. Forinstance, in some embodiments the second semiconductor material 14 andthe first semiconductor material 40 may both comprise silicon. In otherembodiments, one of the first and second semiconductor materials 14 and40 may comprise, consist essentially of, or consist of silicon; whilethe other comprises a different semiconductor material.

Referring to FIG. 16, the sacrificial material 63 of FIG. 15 is replacedwith conductive material 33. Accordingly, the stack 58 becomes a stack28 of the type described above with reference to FIG. 5. The material 61of levels 60 of FIG. 16 may be the same material 31 as utilized for theinsulative levels 30 of FIG. 5.

In some embodiments the material 63 (FIG. 15) of stack 58 may compriseconductive material analogous to the conductive material 33. In suchembodiments, the gate replacement described relative to FIG. 16 may beomitted.

The assembly of FIG. 16 comprises the structures 44 along the bottomregions 42 of the channel material pillars 22. The structures 44comprise the etch-stop material 46, and are in a configuration analogousto that described above with reference to FIG. 5. In other embodiments,void regions may be formed beneath the etch-stop material 46 analogousto the embodiment of FIG. 7 (with the void regions of FIG. 7 being shownas void regions 52). FIGS. 17 and 18 describe example processing whichmay be utilized to form such void regions.

Referring to FIG. 17, construction 10 is shown at a process stage whichmay follow that of FIG. 13; and which may be alternative to that of FIG.14. The process stage of FIG. 14 utilized a substantially anisotropicetch to penetrate through the etch-stop material 46. In contrast, theprocess stage of FIG. 17 shows a configuration resulting after anisotropic etch is utilized to penetrate through the etch-stop material46. The isotropic etch forms void regions 52, and in the shownembodiment leaves remaining portions of the etch-stop material 46 overthe void regions. In other embodiments, the isotropic etching may removean entirety of the etch-stop material 46.

FIG. 18 shows a process stage subsequent to that of FIG. 17, andanalogous to that of FIG. 16. The construction 10 of FIG. 18 may beidentical to that described above with reference to FIG. 7.

The embodiment of FIG. 11 shows the etch-stop material 46 configured asa liner extending conformally along inner surfaces of the openings 54.In other embodiments, the etch-stop material may be deposited as a layeralong lower regions of the openings. For instance, FIG. 19 showsconstruction 10 at a process stage which may follow that of FIG. 9.Openings 54 a have been formed through mass 36 and filled with materials46 and 48.

The openings 54 a of FIG. 19 have a different shape than the openings 54of FIG. 10 (and specifically have straight sidewalls rather than thetapered sidewalls of the openings 54). In other embodiments, openingshaving tapered sidewalls may be utilized instead of the openings 54 ahaving the straight sidewalls at the processing stage of FIG. 19. Also,it is noted that in some embodiments the openings 54 of FIG. 10 may bereplaced with openings having straight sidewalls analogous to theopenings 54 a of FIG. 19.

The materials 46 and 48 together form plugs 56 a analogous to the plugs56 of FIG. 12.

The construction of FIG. 19 is at a processing stage analogous to thatof FIG. 12, and comprises the stack 58.

Referring to FIG. 20, openings 64 are formed to extend through the stack58, and through the material 48 of the plugs 56 a (with the plugs 56 abeing shown in FIG. 19). The openings 64 terminate on the etch-stopmaterial 46.

Referring to FIG. 21, the openings 64 are extended through etch-stopmaterial 46 (FIG. 20) with an isotropic etch which removes all of thematerial 46. In the illustrated embodiment, the openings 64 stop on theupper surface 39 of the conductive structure 38. In other embodiments,the openings may penetrate into the conductive material 40 of theconductive structure 38.

Referring to FIG. 22, the channel material pillars 22 are formed withinopenings 64 (FIG. 21), together with the tunneling material 16,charge-storage material 18 and charge-blocking material 20. Also,sacrificial material 63 (FIG. 21) is replaced with conductive material33 to form a stack 28 of alternating insulative levels and conductivelevels.

The illustrated embodiment shows the charge-blocking material 20extending to under the material 48 of plugs 56 a (with the plugs beingdescribed above with reference to FIG. 19). In other embodiments, thematerial 20 may extend only partially under the material 48 to leavevoids under the material 48.

The assemblies and structures discussed above may be utilized withinintegrated circuits (with the term “integrated circuit” meaning anelectronic circuit supported by a semiconductor substrate); and may beincorporated into electronic systems. Such electronic systems may beused in, for example, memory modules, device drivers, power modules,communication modems, processor modules, and application-specificmodules, and may include multilayer, multichip modules. The electronicsystems may be any of a broad range of systems, such as, for example,cameras, wireless devices, displays, chip sets, set top boxes, games,lighting, vehicles, clocks, televisions, cell phones, personalcomputers, automobiles, industrial control systems, aircraft, etc.

Unless specified otherwise, the various materials, substances,compositions, etc. described herein may be formed with any suitablemethodologies, either now known or yet to be developed, including, forexample, atomic layer deposition (ALD), chemical vapor deposition (CVD),physical vapor deposition (PVD), etc.

The terms “dielectric” and “insulative” may be utilized to describematerials having insulative electrical properties. The terms areconsidered synonymous in this disclosure. The utilization of the term“dielectric” in some instances, and the term “insulative” (or“electrically insulative”) in other instances, may be to providelanguage variation within this disclosure to simplify antecedent basiswithin the claims that follow, and is not utilized to indicate anysignificant chemical or electrical differences.

The particular orientation of the various embodiments in the drawings isfor illustrative purposes only, and the embodiments may be rotatedrelative to the shown orientations in some applications. Thedescriptions provided herein, and the claims that follow, pertain to anystructures that have the described relationships between variousfeatures, regardless of whether the structures are in the particularorientation of the drawings, or are rotated relative to suchorientation.

The cross-sectional views of the accompanying illustrations only showfeatures within the planes of the cross-sections, and do not showmaterials behind the planes of the cross-sections, unless indicatedotherwise, in order to simplify the drawings.

When a structure is referred to above as being “on” or “against” anotherstructure, it can be directly on the other structure or interveningstructures may also be present. In contrast, when a structure isreferred to as being “directly on” or “directly against” anotherstructure, there are no intervening structures present.

Structures (e.g., layers, materials, etc.) may be referred to as“extending vertically” to indicate that the structures generally extendupwardly from an underlying base (e.g., substrate). Thevertically-extending structures may extend substantially orthogonallyrelative to an upper surface of the base, or not.

Some embodiments include an assembly which has channel material pillars,and memory cells along the channel material pillars. A conductivestructure is under the channel material pillars. The conductivestructure has doped semiconductor material in direct contact with bottomregions of the channel material pillars. One or more of magnesium,scandium, yttrium and lanthanide elements is along the bottom regions ofthe channel material pillars.

Some embodiments include an assembly having a horizontally-extendingstructure comprising a first semiconductor material, and having one ormore vertically-extending structures over the horizontally-extendingstructure and comprising a second semiconductor material. The secondsemiconductor material of said one or more vertically-extendingstructures directly contacts the first semiconductor material of thehorizontally-extending structure along terminal ends of the one or morevertically-extending structures. The terminal ends of the one or morevertically-extending structures are comprised by bottom regions of theone or more vertically-extending structures. One or more of magnesium,scandium, yttrium and lanthanide elements is along the bottom regions ofthe one or more vertically-extending structures.

Some embodiments include a method of forming an assembly. Ahorizontally-extending structure is formed, with thehorizontally-extending structure comprising first semiconductormaterial. A mass is formed across an upper surface of the firstsemiconductor material and is directly against the upper surface of thefirst semiconductor material. Openings are formed to extend through themass. Plugs are formed within the openings. The plugs comprise a secondmaterial over a first material. The first material includes one or moreof magnesium, scandium, yttrium and lanthanide elements. The secondmaterial is compositionally different from the first material. A stackof alternating first and second levels is formed over the mass and theplugs. Openings are formed through the stack and the second material ofthe plugs. The openings terminate on the first material of the plugs.The openings are extended through the first material of the plugs. Afterthe openings are extended through the first material,vertically-extending channel material pillars are formed within theopenings. The vertically-extending channel material pillars comprisesecond semiconductor material.

In compliance with the statute, the subject matter disclosed herein hasbeen described in language more or less specific as to structural andmethodical features. It is to be understood, however, that the claimsare not limited to the specific features shown and described, since themeans herein disclosed comprise example embodiments. The claims are thusto be afforded full scope as literally worded, and to be appropriatelyinterpreted in accordance with the doctrine of equivalents.

We claim:
 1. An assembly, comprising: channel material pillars whichextend vertically; memory cells along the channel material pillars; aconductive structure under the channel material pillars and comprisingdoped semiconductor material in direct contact with bottom regions ofthe channel material pillars; and a material consisting of scandiumoxide along the bottom regions of the channel material pillars, whereinthe scandium oxide is within annular structures which extend around thebottom regions of the channel material pillars.
 2. The assembly of claim1 wherein the bottom regions of the channel material pillars includeterminal ends of the channel material pillars, and include non-terminalsegments above the terminal ends; and wherein the annular structures arealong the non-terminal segments and not along the terminal ends.
 3. Theassembly of claim 2 wherein void regions are under the annularstructures.
 4. The assembly of claim 1 wherein the bottom regions of thechannel material pillars include terminal ends of the channel materialpillars; and wherein the annular structures are along the terminal ends.5. An assembly comprising: a horizontally-extending structure comprisinga first semiconductor material; one or more vertically-extendingstructures over the horizontally-extending structure and comprising asecond semiconductor material; the second semiconductor material of saidone or more vertically-extending structures directly contacting thefirst semiconductor material of the horizontally-extending structurealong terminal ends of the one or more vertically-extending structures;said terminal ends of the one or more vertically-extending structuresbeing comprised by bottom regions of the one or morevertically-extending structures; and a material consisting of scandiumoxide along the bottom regions of the one or more vertically-extendingstructures, the material consisting of scandium oxide being spaced fromthe bottom regions by one or more intervening material.
 6. The assemblyof claim 5 wherein the first and second semiconductor materials comprisea same composition as one another.
 7. The assembly of claim 5 whereinthe first and second semiconductor materials comprise differentcompositions relative to one another.
 8. The assembly of claim 5 whereinboth the first semiconductor material and the second semiconductormaterial comprise silicon.